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RIE 2 - fluorine
- Anisotropic etching of SiO2, Si3N4, and Si with CF4, CHF3, SF6, and O2
- Resist stripping or ashing with O2
- Endpoint detection via spectrometer
- Processing for small pieces, 50, 100, and 150 mm wafers
Tool Specs
Manufacturer | Sentech |
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Model | Etchlab 2000 |
Typical Application | Si, SiO2, and Si3N4 etching |
Location | 6060.6 |
Related Documents | |
Training Contact | info@4dlabs.ca |
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