Plasma stripper 1

  • Parallel plate design
  • Resist stripping or ashing with O2 (Ar gas also available
  • 450 W reactor
  • Processing for substrates from small pieces to 150 mm wafers

 

Tool Specs

Manufacturer Technics
Model PEII-A
Typical Application Photoresist ashing
Location 6060.5
Related Documents

Standard Operating Procedure
Training Contact info@4dlabs.ca