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Tube furnace 3 - Si3N4
- Ultra-low stress and stoichiometric silicon nitride LPCVD
- Processing for 50 and 100 mm wafers
Tool Specs
Manufacturer | Tystar |
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Typical Application | Nitride deposition |
Location | 6060.4 |
Related Documents | Standard Operating Procedure |
Training Contact | info@4dlabs.ca |
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