Spin-rinse-dryer
Spin-rinse and drying capability in one chamber.
- Double-stack chamber
- Each SRD chamber is operated by its own programmable controller that accepts user recipe input
- Includes resistivity monitor
- Processing for 50 and 100 mm wafer cassettes
Tool Specs
| Manufacturer | Semitool |
|---|---|
| Model | 840S |
| Typical Application | Rinsing and drying of cassette wafers |
| Location | 6060.5 |
| Training Contact | info@4dlabs.ca |