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RIE 1 - chlorine
- Etching of metals, nitrides, and III/V compounds with Cl2/BCl3
- Etching of polysilicon and silicon with Cl2
- Automated loading and unloading of wafers
- Resist stripping or ashing with O2
- Processing for small pieces, 50 and 100 mm wafers
- Vacuum load lock with automated wafer loading
Tool Specs
Manufacturer | Sentech |
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Model | SI 591 |
Typical Application | Metal and III-V etching |
Location | 6060.6 |
Related Documents | |
Training Contact | info@4dlabs.ca |
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