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Rapid thermal annealer 1
- Temperature range: Up to 1000 ºC
- Temperature ramp rate: 0.1 ºC/s to 200 ºC/s
- O2 and N2 gases
- 100 mm wafer chamber capability
Tool Specs
Manufacturer | AnnealSys |
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Model | AS-One 100 |
Typical Application | Thermal processing |
Location | 6060.6 |
Related Documents | Standard Operating Procedure |
Training Contact | info@4dlabs.ca |
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