PVD 6

  • Sputter: ZnO, Cr, ITO, Nb2O5
  • Sources: 3 sputter, DC and RF
  • 5E-7 Torr base pressure
  • processing for small pieces, 50 mm, 100 mm, and 150 mm wafers

Tool Specs

Manufacturer Kurt J. Lesker
Model PVD75
Typical Application Oxide deposition
Location 6060.10
Related Documents

Standard Operating Procedure
Training Contact info@4dlabs.ca