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PVD 1
- Thermal: 2 sources available, currently not occupied.
- E-beam: Ni, Cr, Al, Ti
- RF Sputter: Al2O3
- DC Sputter: Ni, Al, Al/Si, Cr, Ti
- Sources: 2 thermal, 4 e-beam, 2 DC sputter (1 source for ferromagnetic materials), 2 RF sputter
- 5E-7 Torr base pressure
- Processing for small pieces, 50 and 100 mm wafers
Tool Specs
Manufacturer | Bestec |
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Typical Application | Metal deposition |
Location | 6060.8 |
Related Documents | |
Training Contact | info@4dlabs.ca |
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