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Nanoimprinter
Sample holder for one 4” wafer, wafer fragments or diced wafers
- Thermal, photocurable nanoimprinting and embossing using an air cushion press (ACP) system
- Ultra-uniform, low lateral stress, and low damage to the mold and substrate
- Embossing pressure up to 500psi
- Maximum Temperature of 250°C with heating Rate of 300°C/min and cooling Rate of 150°C/min
- Mercury UV lamp for the exposure of UV-curable resist
Tool Specs
Manufacturer | Nanonex |
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Model | NX-2004 |
Typical Application | Nanoimprint lithography |
Location | 6060.13 |
Related Documents | Standard Operating Procedure |
Training Contact | info@4dlabs.ca |
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