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Electron beam lithography
- minimum feature size: 20 nm
- beam energy: 100 eV – 30 keV
- thermal field emission source
- laser-interferometer controlled stage with 2 nm precision
- small pieces up to 100 mm wafers
- load lock for faster sample loading
- laser height sensing for focus correction
Tool Specs
Manufacturer | Raith |
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Model | e_LiNE |
Typical Application | Electron beam lithography |
Location | 6060.17 |
Related Documents | |
Training Contact | info@4dlabs.ca |
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