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Developer station
This tool is used to run spin development programs on photoresist. It is equipped with the following dispense options:
- AZ 300 MIF developer
- PPD 455 developer
- AZ 400K 1:4 developer
- Front-side rinse
- Back-side rinse
There are vacuum chucks for chips, 50 mm wafers, 100 mm wafers, 4" masks, and 5" masks.
Tool Specs
Manufacturer | CEE |
---|---|
Model | 200XD |
Typical Application | Automatic development of photoresist |
Location | 6060.7 |
Related Documents | |
Training Contact | info@4dlabs.ca |
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