This tool is used to run spin development programs on photoresist. It is equipped with the following dispense options:
- AZ 300 MIF developer
- PPD 455 developer
- AZ 400K 1:4 developer
- Front-side rinse
- Back-side rinse
There are vacuum chucks for chips, 50 mm wafers, 100 mm wafers, 4" masks, and 5" masks.
|Typical Application||Automatic development of photoresist|