Critical point dryer

The Critical Point Dryer is used to dry samples without the damaging effect of surface tension.  The basic operation of the CPD is as follows:

  1. Immerse sample in IPA in the chamber.
  2. Cool the chamber with liquid CO2.
  3. Fill chamber with liquid CO2.
  4. Continually replace IPA/CO2 mixture with pure liquid CO2.
  5. Heat the chamber past the critical point of CO2 (31 °C, 1072 psi).
  6. Vent the gaseous CO2.
  7. Remove the sample.

An entire process run takes ~1 hour and samples up to 4" wafers can be used in the tool.


Tool Specs

Manufacturer Tousimis
Model Autosamdri-815B, Series B
Typical Application Drying MEMs samples
Location 6060.3
Related Documents

Standard Operating Procedure

Training Contact