D
Direct Write Laser Lithography
- positive and negative tone resist processing
- i-line exposure using a diode laser
- grey scale and 3D lithography capabilities
- patterning over areas up to 4"x4"
- 1 µm minimum feature size
E
Electron Beam Lithography
- positive and negative tone resist processing
- variable sample sizes up to 5" wafers
- mask writing capabilities
- patterning of nanoscale features
Electron Energy Loss Spectroscopy
- atomic composition measurements
- chemical bonding and oxidation state information
- valence and conduction band electronic properties
Energy Dispersive X-Ray Spectroscopy
- elemental mapping of thin films and nanostructures
- semi-quantitative analysis
Epitaxial Growth of Materials
